Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films
Authors:
Vasiliev, Ion; Iovu, Mihail; Colomeico, Eduard
Summary:
The photocapacitance relaxation of GexAsxSe1-2x thin films is investigated for x=0.05, 0.07,
0.09, 0.14, 0.16, 0.18, 0.20 0.25, and 0.30. Compositional dependences of the low-frequency
dielectric permeability, decay time constant and the Kohlrausch parameter of nonexponentiality
are deduced from these data. All parameters show two compositional thresholds, one situated
near the xc(1)=0.09, and the other near the xc(2)=0.16-0.18. These phase transitions have been
identified in the bulk samples by means of a differential-scanning calorimetric method
(P. Boolchand et al., Europhys. Lett., 52, p. 633, 2000).
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<meta name="citation_title" content="<p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p>"> <meta name="citation_author" content="Vasiliev, Ion"> <meta name="citation_author" content="Iovu, Mihail"> <meta name="citation_author" content="Colomeico, Eduard"> <meta name="citation_publication_date" content="2011/06/05"> <meta name="citation_journal_title" content="Moldavian Journal of the Physical Sciences"> <meta name="citation_volume" content="10"> <meta name="citation_issue" content="2"> <meta name="citation_firstpage" content="189"> <meta name="citation_lastpage" content="193"> <meta name="citation_pdf_url" content="https://ibn.idsi.md/sites/default/files/imag_file/Photocapacitance%20relaxation%20and%20rigidity%20transition%20in%20GexAsxSe1_2x%20amorphous%20films.pdf">
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<?xml version='1.0' encoding='utf-8'?> <doi_batch version='4.3.7' xmlns='http://www.crossref.org/schema/4.3.7' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.crossref.org/schema/4.3.7 http://www.crossref.org/schema/deposit/crossref4.3.7.xsd'> <head> <doi_batch_id>ibn-4367</doi_batch_id> <timestamp>1597491957</timestamp> <depositor> <depositor_name>Information Society Development Instiute, Republic of Moldova</depositor_name> <email_address>mjps@nanotech.md</email_address> </depositor> <registrant>Institutul de Inginerie Electronică şi Nanotehnologii "D. Ghiţu" al AŞM</registrant> </head> <body> <journal> <journal_metadata> <full_title>Moldavian Journal of the Physical Sciences</full_title> <issn media_type='print'>1810648X</issn> </journal_metadata> <journal_issue> <publication_date media_type='print'> <year>2011</year> </publication_date> <issue>2(10)</issue> </journal_issue> <journal_article publication_type='full_text'><titles> <title><p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p></title> </titles> <contributors> <person_name sequence='first' contributor_role='author'> <given_name>Ion</given_name> <surname>Vasiliev</surname> </person_name> <person_name sequence='additional' contributor_role='author'> <given_name>Mihail</given_name> <surname>Iovu</surname> </person_name> <person_name sequence='additional' contributor_role='author'> <given_name>Eduard</given_name> <surname>Colomeico</surname> </person_name> </contributors> <publication_date media_type='print'> <year>2011</year> </publication_date> <pages> <first_page>189</first_page> <last_page>193</last_page> </pages> </journal_article> </journal> </body> </doi_batch>
CERIF
<?xml version='1.0' encoding='utf-8'?> <CERIF xmlns='urn:xmlns:org:eurocris:cerif-1.5-1' xsi:schemaLocation='urn:xmlns:org:eurocris:cerif-1.5-1 http://www.eurocris.org/Uploads/Web%20pages/CERIF-1.5/CERIF_1.5_1.xsd' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' release='1.5' date='2012-10-07' sourceDatabase='Output Profile'> <cfResPubl> <cfResPublId>ibn-ResPubl-4367</cfResPublId> <cfResPublDate>2011-06-05</cfResPublDate> <cfVol>10</cfVol> <cfIssue>2</cfIssue> <cfStartPage>189</cfStartPage> <cfISSN>1810-648X</cfISSN> <cfURI>http://mjps.utm.md/archive/2011/article/4367</cfURI> <cfTitle cfLangCode='EN' cfTrans='o'><p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p></cfTitle> <cfAbstr cfLangCode='EN' cfTrans='o'>The photocapacitance relaxation of GexAsxSe1-2x thin films is investigated for x=0.05, 0.07, 0.09, 0.14, 0.16, 0.18, 0.20 0.25, and 0.30. Compositional dependences of the low-frequency dielectric permeability, decay time constant and the Kohlrausch parameter of nonexponentiality are deduced from these data. All parameters show two compositional thresholds, one situated near the xc(1)=0.09, and the other near the xc(2)=0.16-0.18. These phase transitions have been identified in the bulk samples by means of a differential-scanning calorimetric method (P. Boolchand et al., Europhys. Lett., 52, p. 633, 2000). </cfAbstr> <cfResPubl_Class> <cfClassId>eda2d9e9-34c5-11e1-b86c-0800200c9a66</cfClassId> <cfClassSchemeId>759af938-34ae-11e1-b86c-0800200c9a66</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> </cfResPubl_Class> <cfResPubl_Class> <cfClassId>e601872f-4b7e-4d88-929f-7df027b226c9</cfClassId> <cfClassSchemeId>40e90e2f-446d-460a-98e5-5dce57550c48</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> </cfResPubl_Class> <cfPers_ResPubl> <cfPersId>ibn-person-1081</cfPersId> <cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId> <cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> </cfPers_ResPubl> <cfPers_ResPubl> <cfPersId>ibn-person-287</cfPersId> <cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId> <cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> </cfPers_ResPubl> <cfPers_ResPubl> <cfPersId>ibn-person-994</cfPersId> <cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId> <cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> </cfPers_ResPubl> </cfResPubl> <cfPers> <cfPersId>ibn-Pers-1081</cfPersId> <cfPersName_Pers> <cfPersNameId>ibn-PersName-1081-3</cfPersNameId> <cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId> <cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> <cfFamilyNames>Vasiliev</cfFamilyNames> <cfFirstNames>Ion</cfFirstNames> </cfPersName_Pers> </cfPers> <cfPers> <cfPersId>ibn-Pers-287</cfPersId> <cfPersName_Pers> <cfPersNameId>ibn-PersName-287-3</cfPersNameId> <cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId> <cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> <cfFamilyNames>Iovu</cfFamilyNames> <cfFirstNames>Mihail</cfFirstNames> </cfPersName_Pers> </cfPers> <cfPers> <cfPersId>ibn-Pers-994</cfPersId> <cfPersName_Pers> <cfPersNameId>ibn-PersName-994-3</cfPersNameId> <cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId> <cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId> <cfStartDate>2011-06-05T24:00:00</cfStartDate> <cfFamilyNames>Colomeico</cfFamilyNames> <cfFirstNames>Eduard</cfFirstNames> </cfPersName_Pers> </cfPers> </CERIF>
BibTeX
@article{ibn_4367,
author = {Vasiliev, I.A. and Iovu, M.S. and Colomeico, E.P.},
title = {<p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p>},
journal = {Moldavian Journal of the Physical Sciences},
year = {2011},
volume = {10 (2)},
pages = {189-193},
month = {Jun},
abstract = {(EN) The photocapacitance relaxation of GexAsxSe1-2x thin films is investigated for x=0.05, 0.07,
0.09, 0.14, 0.16, 0.18, 0.20 0.25, and 0.30. Compositional dependences of the low-frequency
dielectric permeability, decay time constant and the Kohlrausch parameter of nonexponentiality
are deduced from these data. All parameters show two compositional thresholds, one situated
near the xc(1)=0.09, and the other near the xc(2)=0.16-0.18. These phase transitions have been
identified in the bulk samples by means of a differential-scanning calorimetric method
(P. Boolchand et al., Europhys. Lett., 52, p. 633, 2000).
},
url = {https://ibn.idsi.md/vizualizare_articol/4367},
}
DataCite
<?xml version='1.0' encoding='utf-8'?> <resource xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xmlns='http://datacite.org/schema/kernel-3' xsi:schemaLocation='http://datacite.org/schema/kernel-3 http://schema.datacite.org/meta/kernel-3/metadata.xsd'> <creators> <creator> <creatorName>Vasiliev, I.A.</creatorName> <affiliation>Institutul de Fizică Aplicată al AŞM, Moldova, Republica</affiliation> </creator> <creator> <creatorName>Iovu, M.S.</creatorName> <affiliation>Institutul de Fizică Aplicată al AŞM, Moldova, Republica</affiliation> </creator> <creator> <creatorName>Colomeico, E.P.</creatorName> <affiliation>Institutul de Fizică Aplicată al AŞM, Moldova, Republica</affiliation> </creator> </creators> <titles> <title xml:lang='en'><p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p></title> </titles> <publisher>Instrumentul Bibliometric National</publisher> <publicationYear>2011</publicationYear> <relatedIdentifier relatedIdentifierType='ISSN' relationType='IsPartOf'>1810-648X</relatedIdentifier> <dates> <date dateType='Issued'>2011-06-05</date> </dates> <resourceType resourceTypeGeneral='Text'>Journal article</resourceType> <descriptions> <description xml:lang='en' descriptionType='Abstract'>The photocapacitance relaxation of GexAsxSe1-2x thin films is investigated for x=0.05, 0.07, 0.09, 0.14, 0.16, 0.18, 0.20 0.25, and 0.30. Compositional dependences of the low-frequency dielectric permeability, decay time constant and the Kohlrausch parameter of nonexponentiality are deduced from these data. All parameters show two compositional thresholds, one situated near the xc(1)=0.09, and the other near the xc(2)=0.16-0.18. These phase transitions have been identified in the bulk samples by means of a differential-scanning calorimetric method (P. Boolchand et al., Europhys. Lett., 52, p. 633, 2000). </description> </descriptions> <formats> <format>application/pdf</format> </formats> </resource>
Dublin Core
<?xml version='1.0' encoding='utf-8'?> <oai_dc:dc xmlns:dc='http://purl.org/dc/elements/1.1/' xmlns:oai_dc='http://www.openarchives.org/OAI/2.0/oai_dc/' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd'> <dc:creator>Vasiliev, I.A.</dc:creator> <dc:creator>Iovu, M.S.</dc:creator> <dc:creator>Colomeico, E.P.</dc:creator> <dc:date>2011-06-05</dc:date> <dc:description xml:lang='en'>The photocapacitance relaxation of GexAsxSe1-2x thin films is investigated for x=0.05, 0.07, 0.09, 0.14, 0.16, 0.18, 0.20 0.25, and 0.30. Compositional dependences of the low-frequency dielectric permeability, decay time constant and the Kohlrausch parameter of nonexponentiality are deduced from these data. All parameters show two compositional thresholds, one situated near the xc(1)=0.09, and the other near the xc(2)=0.16-0.18. These phase transitions have been identified in the bulk samples by means of a differential-scanning calorimetric method (P. Boolchand et al., Europhys. Lett., 52, p. 633, 2000). </dc:description> <dc:source>Moldavian Journal of the Physical Sciences 10 (2) 189-193</dc:source> <dc:title><p>Photocapacitance relaxation and rigidity transition in GexAsxSe1-2x amorphous films</p></dc:title> <dc:type>info:eu-repo/semantics/article</dc:type> </oai_dc:dc>