Archive: 2005 - Moldavian Journal of the Physical Sciences

05 Dec 2005

2005
V. 4
4
(p.468 - 472)

Nanomechanical parameters of new carbazolyle-containing photoresist polymers

Authors:

Palistrant, Natalia

Summary:

The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate the nanomechanical parameters of polymer films. The reliability of the chosen analytical method was checked using number of repeats. The influence of chemical composition, action of UF-light and aging on the nanomechanical properties of CAM: OMA and PEPC were investigated.

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Crossref

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BibTeX

@article{ibn_3366,
author = {Palistrant, N.A.},
title = {Nanomechanical parameters of new carbazolyle-containing photoresist polymers},
journal = {Moldavian Journal of the Physical Sciences},
year = {2005},
volume = {4 (4)},
pages = {468-472},
month = {Dec},
abstract = {(EN) The  new  photopolymer  layers  from  carbazolemethacrylates  (CAM)  with 

oktylmethacrylates  (OMA)  and  polyepoxypropylcarbazole  (PEPC)  were  prepared  and 

investigated  by  us.   Load  and  depth  sensing  indentation  with  a  Berkovich  indenter  were 
performed  in  order  to  evaluate  the  nanomechanical  parameters  of  polymer  films.  The 
reliability  of  the  chosen  analytical  method  was  checked  using  number  of  repeats.  The 
influence  of  chemical  composition,  action  of  UF-light  and  aging  on  the  nanomechanical 
properties of CAM: OMA and PEPC were investigated. },
url = {https://ibn.idsi.md/vizualizare_articol/3366},
}

DataCite

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<creatorName>Palistrant, N.A.</creatorName>
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<titles>
<title xml:lang='ro'>Nanomechanical parameters of new carbazolyle-containing photoresist polymers</title>
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<publisher>Instrumentul Bibliometric National</publisher>
<publicationYear>2005</publicationYear>
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<description xml:lang='en' descriptionType='Abstract'>The  new  photopolymer  layers  from  carbazolemethacrylates  (CAM)  with 

oktylmethacrylates  (OMA)  and  polyepoxypropylcarbazole  (PEPC)  were  prepared  and 

investigated  by  us.   Load  and  depth  sensing  indentation  with  a  Berkovich  indenter  were 
performed  in  order  to  evaluate  the  nanomechanical  parameters  of  polymer  films.  The 
reliability  of  the  chosen  analytical  method  was  checked  using  number  of  repeats.  The 
influence  of  chemical  composition,  action  of  UF-light  and  aging  on  the  nanomechanical 
properties of CAM: OMA and PEPC were investigated. </description>
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Dublin Core

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<dc:creator>Palistrant, N.A.</dc:creator>
<dc:date>2005-12-05</dc:date>
<dc:description xml:lang='en'>The  new  photopolymer  layers  from  carbazolemethacrylates  (CAM)  with 

oktylmethacrylates  (OMA)  and  polyepoxypropylcarbazole  (PEPC)  were  prepared  and 

investigated  by  us.   Load  and  depth  sensing  indentation  with  a  Berkovich  indenter  were 
performed  in  order  to  evaluate  the  nanomechanical  parameters  of  polymer  films.  The 
reliability  of  the  chosen  analytical  method  was  checked  using  number  of  repeats.  The 
influence  of  chemical  composition,  action  of  UF-light  and  aging  on  the  nanomechanical 
properties of CAM: OMA and PEPC were investigated. </dc:description>
<dc:source>Moldavian Journal of the Physical Sciences 4 (4) 468-472</dc:source>
<dc:title>Nanomechanical parameters of new carbazolyle-containing photoresist polymers</dc:title>
<dc:type>info:eu-repo/semantics/article</dc:type>
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