Archive: 2005 - Moldavian Journal of the Physical Sciences

05 Jan 2005

2005
V. 4
1
(p.102 - 105)

SnO2 thin film parameter influence on gas sensitive characteristics

Authors:

Brînzari, Vladimir; Korotcenkov, Ghenadie; Dmitriev, Serghei

Summary:

In this report we present results of investigation of influence of the parameters of SnO2 thin film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method. The influence of technologic parameters on concentration of free electrons n, stoichiometry, thickness d and gas sensitivity S=Rgas/Rair was investigated by means of electrophysical, IR-spectroscopy and SIMS measurements. It was established that optimal spray solution s composition is 0.2M, which allows depositing of SnO2 films with required parameters: n-1018 -1019 cm-3, R=105 -106 and S>10 correspondently. Obtained results on gas sensitivity are compared with results of theoretical considerations.

Download PDF

Export Metadata

Google Scholar

<meta name="citation_title" content="SnO2 thin film parameter influence on gas sensitive characteristics">
<meta name="citation_author" content="Brînzari, Vladimir">
<meta name="citation_author" content="Korotcenkov, Ghenadie">
<meta name="citation_author" content="Dmitriev, Serghei">
<meta name="citation_publication_date" content="2005/01/05">
<meta name="citation_journal_title" content="Moldavian Journal of the Physical Sciences">
<meta name="citation_volume" content="4">
<meta name="citation_issue" content="1">
<meta name="citation_firstpage" content="102">
<meta name="citation_lastpage" content="105">
<meta name="citation_pdf_url" content="https://ibn.idsi.md/sites/default/files/imag_file/SnO2%20thin%20film%20parameter%20influence%20on%20gas%20sensitive%20characteristics.pdf">

Crossref

<?xml version='1.0' encoding='utf-8'?>
<doi_batch version='4.3.7' xmlns='http://www.crossref.org/schema/4.3.7' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.crossref.org/schema/4.3.7 http://www.crossref.org/schema/deposit/crossref4.3.7.xsd'>
<head>
<doi_batch_id>ibn-3075</doi_batch_id>
<timestamp>1597501882</timestamp>
<depositor>
<depositor_name>Information Society Development Instiute, Republic of Moldova</depositor_name>
<email_address>mjps@nanotech.md</email_address>
</depositor>
<registrant>Institutul de Inginerie Electronică şi Nanotehnologii "D. Ghiţu" al AŞM</registrant>
</head>
<body>
<journal>
<journal_metadata>
<full_title>Moldavian Journal of the Physical Sciences</full_title>
<issn media_type='print'>1810648X</issn>
</journal_metadata>
<journal_issue>
<publication_date media_type='print'>
<year>2005</year>
</publication_date>
<issue>1(4)</issue>
</journal_issue>
<journal_article publication_type='full_text'><titles>
<title>SnO2 thin film parameter influence on gas sensitive characteristics</title>
</titles>
<contributors>
<person_name sequence='first' contributor_role='author'>
<given_name>Vladimir</given_name>
<surname>Brînzari</surname>
</person_name>
<person_name sequence='additional' contributor_role='author'>
<given_name>Ghenadie</given_name>
<surname>Korotcenkov</surname>
</person_name>
<person_name sequence='additional' contributor_role='author'>
<given_name>Serghei</given_name>
<surname>Dmitriev</surname>
</person_name>
</contributors>
<publication_date media_type='print'>
<year>2005</year>
</publication_date>
<pages>
<first_page>102</first_page>
<last_page>105</last_page>
</pages>
</journal_article>
</journal>
</body>
</doi_batch>

CERIF

<?xml version='1.0' encoding='utf-8'?>
<CERIF xmlns='urn:xmlns:org:eurocris:cerif-1.5-1' xsi:schemaLocation='urn:xmlns:org:eurocris:cerif-1.5-1 http://www.eurocris.org/Uploads/Web%20pages/CERIF-1.5/CERIF_1.5_1.xsd' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' release='1.5' date='2012-10-07' sourceDatabase='Output Profile'>
<cfResPubl>
<cfResPublId>ibn-ResPubl-3075</cfResPublId>
<cfResPublDate>2005-01-05</cfResPublDate>
<cfVol>4</cfVol>
<cfIssue>1</cfIssue>
<cfStartPage>102</cfStartPage>
<cfISSN>1810-648X</cfISSN>
<cfURI>http://mjps.utm.md/archive/2005/article/3075</cfURI>
<cfTitle cfLangCode='RO' cfTrans='o'>SnO2 thin film parameter influence on gas sensitive characteristics</cfTitle>
<cfAbstr cfLangCode='EN' cfTrans='o'>In this report we present results of investigation of influence of the parameters of SnO2 thin 
film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method.  
The  influence  of  technologic  parameters  on  concentration  of  free  electrons  n, 
stoichiometry,  thickness  d  and  gas  sensitivity  S=Rgas/Rair  was  investigated  by  means  of 
electrophysical, IR-spectroscopy and SIMS measurements. It was established  that optimal spray 
solution s composition is 0.2M, which allows depositing of SnO2  films with required parameters: 
n-1018
-1019 
cm-3, R=105
-106 

and S>10  correspondently. Obtained  results on gas  sensitivity are 
compared with results of theoretical considerations.   </cfAbstr>
<cfResPubl_Class>
<cfClassId>eda2d9e9-34c5-11e1-b86c-0800200c9a66</cfClassId>
<cfClassSchemeId>759af938-34ae-11e1-b86c-0800200c9a66</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
</cfResPubl_Class>
<cfResPubl_Class>
<cfClassId>e601872f-4b7e-4d88-929f-7df027b226c9</cfClassId>
<cfClassSchemeId>40e90e2f-446d-460a-98e5-5dce57550c48</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
</cfResPubl_Class>
<cfPers_ResPubl>
<cfPersId>ibn-person-13314</cfPersId>
<cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId>
<cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
</cfPers_ResPubl>
<cfPers_ResPubl>
<cfPersId>ibn-person-122</cfPersId>
<cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId>
<cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
</cfPers_ResPubl>
<cfPers_ResPubl>
<cfPersId>ibn-person-1006</cfPersId>
<cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId>
<cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
</cfPers_ResPubl>
</cfResPubl>
<cfPers>
<cfPersId>ibn-Pers-13314</cfPersId>
<cfPersName_Pers>
<cfPersNameId>ibn-PersName-13314-2</cfPersNameId>
<cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId>
<cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
<cfFamilyNames>Brînzari</cfFamilyNames>
<cfFirstNames>Vladimir</cfFirstNames>
</cfPersName_Pers>
</cfPers>
<cfPers>
<cfPersId>ibn-Pers-122</cfPersId>
<cfPersName_Pers>
<cfPersNameId>ibn-PersName-122-2</cfPersNameId>
<cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId>
<cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
<cfFamilyNames>Korotcenkov</cfFamilyNames>
<cfFirstNames>Ghenadie</cfFirstNames>
</cfPersName_Pers>
</cfPers>
<cfPers>
<cfPersId>ibn-Pers-1006</cfPersId>
<cfPersName_Pers>
<cfPersNameId>ibn-PersName-1006-2</cfPersNameId>
<cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId>
<cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId>
<cfStartDate>2005-01-05T24:00:00</cfStartDate>
<cfFamilyNames>Дмитриев</cfFamilyNames>
<cfFirstNames>Сергей</cfFirstNames>
</cfPersName_Pers>
</cfPers>
</CERIF>

BibTeX

@article{ibn_3075,
author = {Brînzari, V.I. and Korotcenkov, G.I. and Dmitriev, S.},
title = {SnO2 thin film parameter influence on gas sensitive characteristics},
journal = {Moldavian Journal of the Physical Sciences},
year = {2005},
volume = {4 (1)},
pages = {102-105},
month = {Jan},
abstract = {(EN) In this report we present results of investigation of influence of the parameters of SnO2 thin 
film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method.  
The  influence  of  technologic  parameters  on  concentration  of  free  electrons  n, 
stoichiometry,  thickness  d  and  gas  sensitivity  S=Rgas/Rair  was  investigated  by  means  of 
electrophysical, IR-spectroscopy and SIMS measurements. It was established  that optimal spray 
solution s composition is 0.2M, which allows depositing of SnO2  films with required parameters: 
n-1018
-1019 
cm-3, R=105
-106 

and S>10  correspondently. Obtained  results on gas  sensitivity are 
compared with results of theoretical considerations.   },
url = {https://ibn.idsi.md/vizualizare_articol/3075},
}

DataCite

<?xml version='1.0' encoding='utf-8'?>
<resource xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xmlns='http://datacite.org/schema/kernel-3' xsi:schemaLocation='http://datacite.org/schema/kernel-3 http://schema.datacite.org/meta/kernel-3/metadata.xsd'>
<creators>
<creator>
<creatorName>Brînzari, V.I.</creatorName>
<affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation>
</creator>
<creator>
<creatorName>Korotcenkov, G.I.</creatorName>
<affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation>
</creator>
<creator>
<creatorName>Dmitriev, S.</creatorName>
<affiliation>Universitatea de Stat din Moldova, Moldova, Republica</affiliation>
</creator>
</creators>
<titles>
<title xml:lang='ro'>SnO2 thin film parameter influence on gas sensitive characteristics</title>
</titles>
<publisher>Instrumentul Bibliometric National</publisher>
<publicationYear>2005</publicationYear>
<relatedIdentifier relatedIdentifierType='ISSN' relationType='IsPartOf'>1810-648X</relatedIdentifier>
<dates>
<date dateType='Issued'>2005-01-05</date>
</dates>
<resourceType resourceTypeGeneral='Text'>Journal article</resourceType>
<descriptions>
<description xml:lang='en' descriptionType='Abstract'>In this report we present results of investigation of influence of the parameters of SnO2 thin 
film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method.  
The  influence  of  technologic  parameters  on  concentration  of  free  electrons  n, 
stoichiometry,  thickness  d  and  gas  sensitivity  S=Rgas/Rair  was  investigated  by  means  of 
electrophysical, IR-spectroscopy and SIMS measurements. It was established  that optimal spray 
solution s composition is 0.2M, which allows depositing of SnO2  films with required parameters: 
n-1018
-1019 
cm-3, R=105
-106 

and S>10  correspondently. Obtained  results on gas  sensitivity are 
compared with results of theoretical considerations.   </description>
</descriptions>
<formats>
<format>application/pdf</format>
</formats>
</resource>

Dublin Core

<?xml version='1.0' encoding='utf-8'?>
<oai_dc:dc xmlns:dc='http://purl.org/dc/elements/1.1/' xmlns:oai_dc='http://www.openarchives.org/OAI/2.0/oai_dc/' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd'>
<dc:creator>Brînzari, V.I.</dc:creator>
<dc:creator>Korotcenkov, G.I.</dc:creator>
<dc:creator>Dmitriev, S.</dc:creator>
<dc:date>2005-01-05</dc:date>
<dc:description xml:lang='en'>In this report we present results of investigation of influence of the parameters of SnO2 thin 
film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method.  
The  influence  of  technologic  parameters  on  concentration  of  free  electrons  n, 
stoichiometry,  thickness  d  and  gas  sensitivity  S=Rgas/Rair  was  investigated  by  means  of 
electrophysical, IR-spectroscopy and SIMS measurements. It was established  that optimal spray 
solution s composition is 0.2M, which allows depositing of SnO2  films with required parameters: 
n-1018
-1019 
cm-3, R=105
-106 

and S>10  correspondently. Obtained  results on gas  sensitivity are 
compared with results of theoretical considerations.   </dc:description>
<dc:source>Moldavian Journal of the Physical Sciences 4 (1) 102-105</dc:source>
<dc:title>SnO2 thin film parameter influence on gas sensitive characteristics</dc:title>
<dc:type>info:eu-repo/semantics/article</dc:type>
</oai_dc:dc>

“ ... ”

SM ISO690:2012

BRÎNZARI, Vladimir; KOROTCENKOV, Ghenadie; DMITRIEV, Serghei. SnO2 thin film parameter influence on gas sensitive characteristics. In: Moldavian Journal of the Physical Sciences. 2005, nr. 1(4), pp. 102-105. ISSN 1810-648X.